Difference between revisions of "Tool List"

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===== Physical Vapor Deposition (PVD) =====
 
*[[E-Beam 1 (Sharon)]]
 
*[[E-Beam 1 (Sharon)]]
 
*[[E-Beam 2 (Custom)]]
 
*[[E-Beam 2 (Custom)]]
 
*[[E-Beam 3 (Temescal)]]
 
*[[E-Beam 3 (Temescal)]]
 
*[[E-Beam 4 (CHA)]]
 
*[[E-Beam 4 (CHA)]]
  +
*[[Thermal Evap 1]]
  +
*[[Thermal Evap 2 (Solder)]]
  +
  +
===== Sputter Deposition =====
 
*[[Sputter 3 (AJA ATC 2000-F)]]
 
*[[Sputter 3 (AJA ATC 2000-F)]]
 
*[[Sputter 4 (AJA ATC 2200-V)]]
 
*[[Sputter 4 (AJA ATC 2200-V)]]
 
*[[Sputter 5 (AJA ATC 2200-V)]]
 
*[[Sputter 5 (AJA ATC 2200-V)]]
  +
*[[Ion Beam Deposition (Veeco NEXUS)]]
   
| width="400" |
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| width="400" |
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===== Chemical Vapor Deposition (CVD) =====
 
*[[PECVD 1 (PlasmaTherm 790)]]
 
*[[PECVD 1 (PlasmaTherm 790)]]
 
*[[PECVD 2 (Advanced Vacuum)]]
 
*[[PECVD 2 (Advanced Vacuum)]]
*[[Thermal Evap 1]]
 
*[[Thermal Evap 2 (Solder)]]
 
 
*[[ICP-PECVD (Unaxis VLR)]]
 
*[[ICP-PECVD (Unaxis VLR)]]
*[[Ion Beam Deposition (Veeco NEXUS)]]
 
 
*[[Molecular Vapor Deposition]]
 
*[[Molecular Vapor Deposition]]
 
*[[Atomic Layer Deposision (Oxford FlexAL)|Atomic Layer Deposition (Oxford FlexAL)]]
 
*[[Atomic Layer Deposision (Oxford FlexAL)|Atomic Layer Deposition (Oxford FlexAL)]]

Revision as of 21:56, 3 July 2018

Lithography

You can see our available photoresists on the Chemical Datasheets page.

Contact Aligners (Optical Exposure)
Other Patterning Systems
Steppers (Optical Exposure)
Thermal Processing for Photolithography

Vacuum Deposition

Physical Vapor Deposition (PVD)
Sputter Deposition
Chemical Vapor Deposition (CVD)

Dry Etch

Wet Processing

See the Chemical List page for stocked chemicals such as Developers, Etchants, Solvents etc.

Thermal Processing

Packaging

Inspection, Test and Characterization

Optical/Electron Microscopy
Topographical Metrology
Thin-Film Analysis/Measurement
Other Tools