Difference between revisions of "Tool List"

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(categories for lithography tools)
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===== Optical/Electron Microscopy =====
 
* [[Field Emission SEM 1 (FEI Sirion)]]
 
* [[Field Emission SEM 1 (FEI Sirion)]]
 
* [[Field Emission SEM 2 (JEOL 7600F)]]
 
* [[Field Emission SEM 2 (JEOL 7600F)]]
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* [[SEM Sample Coater (Hummer)]]
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* [[Microscopes|Optical Microscopes]]
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* [[Fluorescence Microscope (Olympus MX51)]]
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* [[Deep UV Optical Microscope (Olympus)]]
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* [[Laser Scanning Confocal M-scope (Olympus LEXT)]]
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* [[Photo-emission & IR Microscope (QFI)]]
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  +
===== Topographical Metrology =====
 
* [[Step Profile (Dektak IIA)]]
 
* [[Step Profile (Dektak IIA)]]
 
* [[Step Profilometer (Dektak 6M)]]
 
* [[Step Profilometer (Dektak 6M)]]
  +
* [[Atomic Force Microsope (Dimension 3100/Nanoscope IVA)]]
* [[Ellipsometer (Rudolph)]]
 
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* [[Surface Analysis (KLA/Tencor Surfscan)]]
* [[Microscopes]]
 
  +
** ''Sub-micron Particle Counter''
* [[Probe Station & Curve Tracer]]
 
  +
* [[Laser Scanning Confocal M-scope (Olympus LEXT)]]
  +
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===== Thin-Film Analysis/Measurement =====
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* [[Ellipsometer (Woollam)]]
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* [[Ellipsometer (Rudolph)]]
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* [[Film Stress (Tencor Flexus)]]
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* Optical Film Thickness (Microscope-Mounted Filmetrics F-40-UV)
 
* [[Optical Film Thickness (Filmetrics)|Optical Film Thickness (Filmetrics F20)]]
 
* [[Optical Film Thickness (Filmetrics)|Optical Film Thickness (Filmetrics F20)]]
* Optical Film Thickness (Microscope-Mounted Filmetrics XYZ)
 
 
* [[Optical Film Thickness (Nanometric)]]
 
* [[Optical Film Thickness (Nanometric)]]
* [[Goniometer]]
 
| width="400" |
 
* [[Film Stress (Tencor Flexus)]]
 
* [[SEM Sample Coater (Hummer)]]
 
* [[Surface Analysis (KLA/Tencor Surfscan)]]
 
* [[Photo-emission & IR Microscope (QFI)]]
 
* [[Ellipsometer (Woollam)]]
 
 
* [[Resistivity Mapper (CDE RESMAP)]]
 
* [[Resistivity Mapper (CDE RESMAP)]]
  +
* [[Laser Scanning Confocal M-scope (Olympus LEXT)]]
 
  +
===== Other Tools =====
* [[Deep UV Optical Microscope (Olympus)]]
 
  +
* [[Probe Station & Curve Tracer]]
* [[Fluorescence Microscope (Olympus MX51)]]
 
  +
* [[Goniometer]]
* [[Atomic Force Microsope (Dimension 3100/Nanoscope IVA)]]
 
 
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Revision as of 13:59, 3 July 2018

Lithography

You can see our available photoresists on the Chemical Datasheets page.

Contact Aligners (Optical Exposure)
Other Patterning Systems
Steppers (Optical Exposure)
Thermal Processing for Photolithography

Vacuum Deposition

Dry Etch

Wet Processing

See the Chemical List page for stocked chemicals such as Developers, Etchants, Solvents etc.

Thermal Processing

Packaging

Inspection, Test and Characterization

Optical/Electron Microscopy
Topographical Metrology
Thin-Film Analysis/Measurement
Other Tools