Difference between revisions of "Tool List"

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(Vacuum Deposition: Updated Sputter 5 link)
(categories for lithography tools)
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===== Contact Aligners (Optical Exposure) =====
 
* [[Suss Aligners (SUSS MJB-3)]]
 
* [[Suss Aligners (SUSS MJB-3)]]
 
* [[IR Aligner (SUSS MJB-3 IR)]]
 
* [[IR Aligner (SUSS MJB-3 IR)]]
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* [[Contact Aligner (SUSS MA-6)]]
 
* [[DUV Flood Expose]]
 
* [[DUV Flood Expose]]
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===== Other Patterning Systems =====
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* [[E-Beam Lithography System (JEOL JBX-6300FS)]]
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* [[Nano-Imprint (Nanonex NX2000)]]
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* [[Holographic Lith/PL Setup (Custom)|Holographic Litho/PL Setup (Custom)]]
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===== Steppers (Optical Exposure) =====
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* [[Stepper 1 (GCA 6300)|Stepper 1 (GCA 6300, i-line)]]
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* [[Stepper 2 (AutoStep 200)|Stepper 2 (AutoStep 200, i-line)]]
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* [[Stepper 3 (ASML DUV)|Stepper 3 (ASML DUV, Deep-UV)]]
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  +
===== Thermal Processing for Photolithography =====
 
* [[Ovens 1, 2 & 3 (Labline)]]
 
* [[Ovens 1, 2 & 3 (Labline)]]
 
* [[Oven 4 (Fisher)]]
 
* [[Oven 4 (Fisher)]]
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* [[High Temp Oven (Blue M)]]
 
* [[High Temp Oven (Blue M)]]
 
* [[Vacuum Oven (YES)]]
 
* [[Vacuum Oven (YES)]]
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* The [https://www.nanotech.ucsb.edu/wiki/index.php/Wet_Benches#Spin_Coat_Benches Spinner Benches] have pre-set hotplates at various temperatures appropriate for common photoresist bakes.
* [[Holographic Lith/PL Setup (Custom)]]
 
| width="400" |
 
* [[Stepper 1 (GCA 6300)]]
 
* [[Stepper 2 (AutoStep 200)]]
 
* [[Stepper 3 (ASML DUV)]]
 
* [[E-Beam Lithography System (JEOL JBX-6300FS)]]
 
* [[Nano-Imprint (Nanonex NX2000)]]
 
* [[Contact Aligner (SUSS MA-6)]]
 
 
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Revision as of 13:25, 3 July 2018

Lithography

You can see our available photoresists on the Chemical Datasheets page.

Contact Aligners (Optical Exposure)
Other Patterning Systems
Steppers (Optical Exposure)
Thermal Processing for Photolithography

Vacuum Deposition

Dry Etch

Wet Processing

See the Chemical List page for stocked chemicals such as Developers, Etchants, Solvents etc.

Thermal Processing

Packaging

Inspection, Test and Characterization