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  • =Wet Processing= **[[HF/TMAH Processing Benches]]
    3 KB (351 words) - 19:54, 8 September 2017
  • #redirect [[Tool_List#Wet Processing]]
    38 bytes (5 words) - 18:00, 27 June 2012
  • #redirect [[Tool_List#Thermal Processing]]
    42 bytes (5 words) - 18:01, 27 June 2012
  • ...processes, facilitates troubleshooting of process and equipment related to processing problems, and acts as a general cleanroom process consultant for all labora
    757 bytes (102 words) - 11:36, 10 July 2013
  • |type = Thermal Processing
    2 KB (250 words) - 11:18, 10 October 2017
  • |type = Wet Processing
    607 bytes (89 words) - 07:07, 11 July 2012
  • |type = Thermal Processing
    1 KB (174 words) - 13:46, 18 July 2012
  • ...ystem is load-locked and can accommodate sample temperatures up to 550°C. Processing temperature windows are defined for each material based on growth limitatio
    2 KB (208 words) - 15:48, 13 July 2015
  • This computer-controlled, turbo-pumped RIE is the "work horse" of the processing laboratory due to it's ease of operation and versatility. It can be operate ...itor and chart recorder. Various devices that use this tool as an integral processing step include: in-plane lasers, VCSELs, micro-lenses, Bragg-Fresnel lens, FE
    2 KB (350 words) - 21:25, 10 September 2017
  • ...tting of water-based surface etchants. This is very important for wet-etch processing through small, high aspect ratio photoresist holes or lines. One system als
    1 KB (198 words) - 19:00, 14 June 2015
  • ...ely 10 um, allowing for measurement of thin films at various points in the processing.
    2 KB (238 words) - 11:02, 22 August 2012
  • |type = Thermal Processing
    1 KB (156 words) - 07:05, 11 July 2012
  • [[Category:Processing]]
    26 KB (3,156 words) - 17:01, 21 September 2017
  • [[Category:Processing]]
    10 KB (1,336 words) - 14:18, 22 September 2017
  • [[Category:Processing]]
    13 KB (1,642 words) - 11:30, 8 September 2017
  • ...re.ieee.org/xpls/abs_all.jsp?arnumber=546406 Etch rates for micromachining processing] Please add any confirmed etches from this reference to the Master Table of ...e.ieee.org/xpls/abs_all.jsp?arnumber=1257354 Etch rates for micromachining processing-part II] Please add any confirmed etches from this reference to the Master
    4 KB (618 words) - 09:28, 29 July 2016
  • [[Category:Processing]]
    81 bytes (9 words) - 17:13, 17 August 2014
  • |type = Thermal Processing
    1 KB (170 words) - 11:43, 31 March 2014
  • ...enclosed emergency showers is located in bay 5 across from the HF/TMAH wet processing bench. If using the emergency shower at the end of the bay, water will spi ...storage area (except HF) is the acid cabinet located next to the acid wet processing benches in bay 5. HF acid is stored in the HF cabinet
    33 KB (5,379 words) - 15:25, 28 September 2017
  • *1 [[HF Processing Bench]] *1 [[HF/TMAH Processing Bench]]
    9 KB (1,274 words) - 10:16, 24 February 2015

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