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Welcome to the UCSB Nanofab Wiki
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Equipment Status

Suss Bonder

Suss Bonder is DOWN. Suss field service is sourcing replacement parts for the bonder repair. An update will be sent out once we have a date scheduled for the service. Silva 10:45, 12 April 2019 (PDT)

E-Beam#2

E-Beam#2 will be down July 29, 2019 until August 16, 2019 for the EBC and power supply upgrade. Silva 12:44, 21 July 2019 (PDT)

How to use this wiki

  • The Nanofab Wiki consists of resources to help our users work better. Here you can find MSDS sheets, information on all the tools in the lab and contact information for all our staff.
  • This wiki site has extensive safety related information on common hazards and work practices and procedures within the facility. All facility users should be familiar with the information as relates to their work.
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  • Users are encouraged to add well qualified process data to the Wiki Processes pages. The Wiki becomes more useful as more in house processes are developed and included in this database.
  • We also welcome device process flow sheets from dissertations for any device types made in the facility.

  • Since there are many users of the facility, with their own unique projects, the management of the facility cannot be responsible for overseeing all aspects of their work.
  • Therefore, the supervisors of individuals using the facility, e.g., UCSB Principal Investigators and external user managers are ultimately responsible for ensuring that their supervisees have the appropriate knowledge and training to work safely in the facility.
  • They are also responsible for ensuring that all applicable regulatory requirements are met. This includes having a compliant "Chemical Hygiene Plan" per OSHA regulations.
  • The information on this site should be considered as providing "general supporting information" to the Chemical Hygiene Plan of a particular supervisor. Supervisors can reference all or some of this site information within their Plans. UCSB EH&S can provide assistance to supervisors in preparing their Plans.


News & Announcements

News from the U.C. Santa Barbara Nanofabrication Facility.

New Plasma Asher Installation

A new YES EcoClean Plasma Strip/Descum System is being installed, for controlled photoresist etching & residue stripping. We will make an announcement when the system has been qualified and is ready for use. // John d 11:03, 7 August 2019 (PDT)

Rapid Thermal Annealer Installed

We are installing and qualifying a new SSI Solaris 150 Rapid Thermal Processor. We will make an announcement when the system is ready and trainings are scheduled. See the SSI RTP Wiki Page here. // John d 12:03, 28 May 2019 (PDT)

S-Cubed Spin/Coat/Dev Station Installation

We are currently in the process of installing a Cube system for automated Spin Coating, Baking, Developing and Edge-Bead Removal on 4-inch and 6-inch wafers. Initially this tool will be solely purposed for Staff and the use of the sponsor, primarily for ASML DUV Stepper wafer prep. As procedures are developed, the system will be opened up for use by all ASML Stepper users, and may eventually be opened for I-Line stepper use as well. // John d 12:10, 20 February 2019 (PST)

Filmetrics Optical Profilometer

A new Filmetrics Profilm3D optical profilometer is being qualified. The system complements the LEXT Confocal Microscope and AFM, by providing large-area profiles (~5-10mm square) with nanometer-level height resolution, and possibly a fast surface roughness measurement. See the Profilm3D Wiki Page for more info on the capabilities and techniques. // John d 10:59, 14 December 2018 (PST)

Filmetrics Optical Measurement Systems

A Filmetrics F10-RT for optical reflection/transmission spectra, and a Filmetrics F50 thin-film wafer-mapping system have been installed. Contact Ning Cao for more info. // John d 15:24, 12 December 2018 (PST)

KLA Tencor Profilometer Installed

We have purchased a new KLA Tencor Stylus Profilometer, that has been installed in Bay 4. // John d 17:28, 12 September 2018 (PDT)

Laser Endpoint Monitors

We've installed new Intellemetrics LEP500 Laser Endpoint Detection monitoring on the DSEiii & ICP#2 & ICP#1 etchers. This allows you to terminate your etch at a calibrated/modeled distance into a layer, and removes the need to calibrate etch rates for most processes. // John d 09:26, 17 July 2018 (PDT)

Metal Processes on the Atomic Layer Deposition

We now have Ruthenium (Ru) and Platinum (Pt) metal depositions developed on the Oxford FlexAL ALD tool. See the Atomic Layer Deposition: Recipes page or contact Bill Mitchell for more information. // Posted: 16:07, 01 June 2017 (PST)

New Deep Silicon Etcher Online

A new Plasma-Therm Versaline DSE III DRIE etcher has been qualified for bosch etch and single-step etches, and is available for use. The new tool features much higher silicon etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer. An Intellemetrics LEP500 laser end point monitor has also been installed on the system. // Posted: 22:16, 27 November 2017 (PST)

2016 Survey Results

See the May 2016 User Survey Results. // Posted: 12:00, 01 May 2016 (PST)

CAIBE Ion Mill Available

The CAIBE (Oxford Ion Mill) is up and running! Contact Brian Lingg for more information. // Posted: 12:00, 01 July 2015 (PST)

NanoFiles SFTP Online

Files generated with Nanofab tools (SEM images, AFM profiles, etc.) are now available on the nanofab SFTP server. Please check SignupMonkey for details. // Posted: 12:00, 07 July 2013 (PST)

For any questions, comments or concerns regarding the wiki, please contact the Wiki Admin.