Six-Target DC/RF Magnetron Sputtering System

Equipment Description:
Six-Target DC/RF Magnetron Sputtering System

AJA International
809 Country Way
North Scituate, MA 02060
Phone: (781) 545-7365
Fax: (7815) 545-4105



General Information and Usage:

The Six-Target DC/RF Sputtering System, built by AJA International uses planar magnetron sources. The sources are contained in tiltable sputter gun modules that allow for maintaining uniformity control at various sample heights. Cross contamination between sources is minimized by using a chimney configuration with very narrow source shutter gaps. Uniformity better than 2% is achieved for various sample heights. 2 DC sources and 2 RF sources allow for co-deposition of materials, including dedicated magnetic films Fe, Ni, and Co. Other materials, such as ITO, Si, Al, Zr, etc. can be reactively RF sputtered in an O2 or N2 environment to produce metal-oxides or nitrides. The deposition chamber is loadlocked providing for fast substrate transfer and consistent, low base pressure. Venting and evacuation are automated with a 1000 l/s magnetically levitated turbo (capable of pumping O2) achieving an ~ 1 E-7 T ultimate pressure. A VAT gate valve is used for process pressure control independent of gas flow. Substrates are clip mounted onto 4 inch carriers. Flow rates are controlled with standard mass flow controllers. Argon is used for the sputter gas, with N2 and O2 used for reactive sputtering. Gun power supplies include: 300W DC magnetron drivers, 13.56 Mhz 300W RF supplies, and a 50W substrate RF supply for in-situ substrate biasing and pre-cleaning. Samples can be heated to 800°C. The system is recipe driven and computer controlled for reproducible results.


Detailed Specifications:

  • 6 target with DC or RF operation
  • Reactive sputtering with N2 or O2 using RF
  • Co-deposition of two materials: DC or RF
  • Magnetic Material Deposition: Fe, Ni, Co
  • SiO2, SiN, ITO, AlN, and other metal-oxide/nitrides possible
  • Low E-7 T ultimate pressure (3 mT typical operating pressure), load-locked chamber
  • 4" diameter sample holder
  • Gun Tilt and Sample height adjustment
  • Deposition uniformity is ~ 1-2% over 4 " diameter
  • Up to 800°C dep temperature in O2 environment
  • RF Biasing of sample during deposition


Contact Information:

For additional information regarding the AJA Sputtering system or if you would like to inquire about using the UCSB Nanofabrication Facility, please contact This email address is being protected from spambots. You need JavaScript enabled to view it. using the telephone number or e-mail address below. 

This email address is being protected from spambots. You need JavaScript enabled to view it.
Phone: (805) 893-3918 ext. 217
E-Mail: This email address is being protected from spambots. You need JavaScript enabled to view it.