Contact Lithography

Processes are in place for several kinds of photoresist. In order to get the best performance from contact lithography, good contact between the photomask and the sample is required. Edge-bead removal techniques for wafers and pieces are described below.

MJB-3 with IR-Backside Alignment








Contact Lithography Recipes & Established Processes

Edge-Bead Removal

Spectra of Aligners with/without filter


Equipment Status
  • ASML DUV: PM March 12 to 15th
    15 February 2019

    ASML will be performing their periodic maintenance on the DUV stepper from Tuesday March 12th through Friday March 15th. Please schedule your work accordingly. // John d 11:02, 15 February 2019 (PST)

  • Suss Bonder
    14 February 2019

    Suss fieldservice found several issues with the system. Suss will evaluate the issues and recommend possible solutions. // Silva 21:36, 13 February 2019 (PST)

  • E-Beam#1
    12 February 2019

    The system is down. The E-Beam#1 power supply and control upgrade started today. We hope to complete the process within 10 business days. We will keep you posted as progress is made. // Silva 21:45, 11 February 2019 (PST)