Use Our Facility

Need a research tool, but would rather not buy it? You can rent it in a new nanofabrication facility with 12,700 ft² of clean room space to work in!

Affordable rates provide you with the tools you need, as well as training and support from our dedicated and knowledgeable staff, that is tailored to your specific research needs.

We support a broad line of lithography, thin-film deposition, reactive ion etching, and characterization tools in support of device fabrication for a variety of materials, including InP, GaAs, GaN, SiC, Si, and other novel materials.

Staff support is available for training, tool fixturing, process consultation, and hands-on work.

Over 40% of our more than 500 per annum user community are from outside academic institutions and industry, doing significant research in our facility.

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Contact Lithography

Processes are in place for several kinds of photoresist. In order to get the best performance from contact lithography, good contact between the photomask and the sample is required. Edge-bead removal techniques for wafers and pieces are described below.

MJB-3 with IR-Backside Alignment








Contact Lithography Recipes & Established Processes

Edge-Bead Removal

Spectra of Aligners with/without filter