RIE 1: Custom, Loadlocked Chlorine Based System

RIE 1: Custom, Loadlocked Chlorine Based System

Equipment Description:
RIE #1 Custom, Loadlocked Chlorine-Based System

Manufacturer:
University of California, Santa Barbara
Santa Barbara, CA 93106
Telephone: (805) 893-8174
Fax: (805) 893-4500

 

 

 

 

 

 

 

General Information and Usage:

The Reactive Ion Etcher #1 is a turbo-pumped plasma deposition system from Sputtered Films that has been modified by the UCSB Nanofabrication Research Facility for chlorine-based reactive ion etching @ 13.56 Mhz. Special features include: a very small volume sample loadlock (for low 02 partial pressure) with integral four inch sample holder and a HeNe laser etch monitor.

Typical materials that are etched with this system include: GaAs/AlGaAs, optical photoresists, and polymers such as polyimides. In addition, various optoelectronic devices such as in-plane lasers, vertical cavity surface emitting lasers (VCSELs), microlenses, FETs, Bragg Fresnel lenses are among the structures and devices that can be processed with this tool. This etcher is the preferred system for obtaining anisotropic etching (straight sidewalls) for the AlGaAs semiconductor system. (See VCSEL device sample photo.)

 

Detailed Specifications:

  • Etch gases include: Cl2, O2, Ar and He
  • Mid 1 E-7 Torr Ultimate Chamber Pressure
  • 13.56 MHz excitation frequency
  • Sample size limited to approximately 2 inches
  • Masking materials include: Ni, Photoresist, Si02, Si3N4, SrF
  • Typical etch conditions for GaAs:
    • 2mT CI2
    • 350 Volts Bias
    • ~ 200 nm / min. Etch Rate

 

Contact Information:

For additional information regarding the RIE #1 Custom, Loadlocked Chlorine-Based System or if you would like to inquire about using the UCSB Nanofabrication Facility, please contact This email address is being protected from spambots. You need JavaScript enabled to view it.  using the telephone number or e-mail address below. 

 

Don Freeborn

Phone: (805) 893-3918 ext. 216
E-Mail: This email address is being protected from spambots. You need JavaScript enabled to view it.

 

Technical and educational staff services are possible through the generosity of the National Science Foundation through support via the NNIN.