Experienced and Knowledgable Staff PDF Print E-mail

The UCSB nanofabrication facility offers expertise in semiconductor-based device fabrication and thin-film processing, providing a broad range of processes to the scientific and research communities, including:

  • Optical Lithography to 400 nm
  • E-beam Lithography to below 30 nm
  • Physical Vapor Deposition of Materials and Dielectrics
  • Plasma Chemical Vapor Deposition
  • Reactive Ion Etching
  • Inductively Couples Plasma-based Etching
  • High-Temperature Annealing
  • Wafer Bonding
  • Wet Chemical Processing
  • Characterization
 
Nanofabrication Facility
Capabilities
Equipment List
Rates
Lithography
Dry Etching
Deposition
Annealing
Wet Processing
Processing Recipes
Document Download
Document Search

Technical and educational staff services are possible through the generosity of the National Science Foundation through support via the NNIN.