FEI Sirion field-emission SEM with Nabity Pattern Generatory System

FEI Sirion field-emission SEM with Nabity Pattern Generatory System Equipment Description:
FEI FESEM with EDAX and Nabity Lithography System

Model:
FEI Sirion SEM, NPGS v.9, EDAX Falcon

 

 

 

 

 

 

 

Manufacturer:

FEI Company (Global Headquarters)
5350 NE Dawson Creek Drive,
Hillsboro, Oregon 97124
Phone: 503-726-7500
Fax: 503-726-7509
EDAX (World Headquarters)
91 McKee Drive
Mahwah, NJ 07430
Phone: 201-529-4880
Fax: 201-529-3156
JC Nabity Lithography Systems
P.O. Box 5354
Bozeman, MT 59717 USA
Voice: (406) 587-0848
FAX: (406) 586-9514

 

General Information and Usage:

This system is a tri-use FESEM imaging and inspection system, EDX elemental analysis system, and small-area electron beam lithography system. The system uses a thermal field emission source to provide a stable high beam current that is necessary for ebeam lithography applications. The accelerating voltage can be adjusted from 200V to 30kV. Using the UHR-mode of the imaging system, less than 5 nm features can be resolved at magnifications up to ~1,000,000 in as little as 10-15 minutes for experienced users. The user interface is extremely user friendly. Elemental analysis and maps linked to the SEM images can be generated with the EDAX-Falcon software. Locally-aligned electron beam lithography can be done to ~15 nm resolution through the integrated Nabity v9 hardware and software. A beam blanker operating at ~1MHz is used to shutter the electron beam on and off for writing applications. Special training, above and beyond SEM training, is required for doing lithography or EDX work. Large area and precision electron-beam writing jobs should be done on our JEOL electron beam writing system.

 

Equipment Specifications:

  • Thermal Field Emission Source for stable writing current
  • Resolution down to below 5 nm
  • Very user friendly software for quick, high resolution imaging
  • Nabity v9 lithography system for ~15 nm resolution writing over small areas
  • EDAX Falcon EDX system for elemental analysis and mapping

Contact Information:

For additional information regarding the FEI Sirion SEM or if you would like to inquire about using the UCSB Nanofabrication Facility, please contact This email address is being protected from spambots. You need JavaScript enabled to view it. using the telephone number or e-mail address below.

This email address is being protected from spambots. You need JavaScript enabled to view it.
Phone: (805) 893-8174
E-Mail: This email address is being protected from spambots. You need JavaScript enabled to view it.

 

Technical and educational staff services are possible through the generosity of the National Science Foundation through support via the NNIN.