ASML S500/300 DUV Stepper

 

Equipment Description:

ASML PAS 5500/300 DUV Stepper

 

Manufacturer:

ASML

 

Link: 

www.asml.com

 

The ASML DUV stepper is a 248nm line stepper for imaging dense features down to below 200nm and isolated line structures down to below 150nm.  The system is a variable NA system and has a field image size of 21 x 21mm for 0.63 NA and a field size of 22mm x 27mm for 0.4 to 0.57NA.  Overlay accuracy is better than 30nm.  The system is configured for 4” wafers and pieces down to 14mm in size can be exposed using a 4” wafer as a carrier.

 

Contact Information: 

For additional information regarding the ASML S500/300 DUV Stepper or if you would like to inquire about using the UCSB Nanofabrication Facility, please contact This email address is being protected from spambots. You need JavaScript enabled to view it. using the telephone number or e-mail address below.

 

This email address is being protected from spambots. You need JavaScript enabled to view it.

Phone:(805) 893-3918 ext. 213

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Technical and educational staff services are possible through the generosity of the National Science Foundation through support via the NNIN.