JEOL 7600F FESEM

Equipment Description:

JEOL 7600F FESEM

 

Manufacturer:

JEOL

 

Link: 

JEOL USA

The JEOL JSM-7600F FESEM is used for imaging a variety of samples made in the facility.  For general specifications, see the link to the system above.  Our system is equipped with a gentle-beam mode of operation where bias is put on the stage, allowing for high resolution imaging at low electron energies impinging the surface.  This is especially useful for imaging low conductivity and insulating materials without the need for conductive layer coatings.  The system can accept a 4” wafer, but only 50mm of the wafer is accessible with the stage movement.  A retractable LABE detector is also installed for high resolution back-scattered electron imaging.

 

Contact Information:

For additional information regarding the JEOL 7600F FESEM or if you would like to inquire about using the UCSB Nanofabrication Facility, please contact This email address is being protected from spambots. You need JavaScript enabled to view it.  using the telephone number or e-mail address below. 

 

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Phone: (805) 893-4974

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Technical and educational staff services are possible through the generosity of the National Science Foundation through support via the NNIN.