Equipment Description:
Tystar 8" 3-Tube Oxidation/Annealing System

Manufacturer and Model:
Tystar Corporation
369 Van Ness Way
Torrance, CA 90501
Phone: 310-781-9219
www.tystar.com

General Information and Usage:

The three stack Tystar 8” furnace is used primarily for 3 processes. The processes are dedicated for one tube each:
1. Dry or wet oxidation of silicon
2. Dry or wet oxidation of AlGaAs (or other materials)
3. General furnace annealing

The tubes can hold up to twenty-five 8” wafers per cycle. We have boats for various wafer sizes, including pieces. The maximum temperature is 1050°C for the system.  Gases used are O₂, Steam from DI-H₂O, N₂. To calculate times for Silicon oxidation, please use the following on-line calculator:  http://www.lelandstanfordjunior.com/thermaloxide.html

Under the “ambient” variable use the following:
Wet – 0.945
Dry – 1.298
These numbers will give accurate growth calculations.

Contact Information:

For additional information regarding the Tystar 8" 3-Tube Oxidation/Annealing System or if you would like to inquire about using the UCSB Nanofabrication Facility, please contact This email address is being protected from spambots. You need JavaScript enabled to view it.  using the telephone number or e-mail address below. 

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Phone: (805) 893-3918 ext. 217

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