JEOL PDF Print E-mail
JEOL logoJEOL has partnered with the UCSB nanofab in the area of electron-beam lithography through a significant discount for the facility’s state-of-the-art electron beam lithography system. The partnership involves regular interaction and collaboration with UCSB and JEOL. The system at the facility has a best demonstrated resolution of 7 nm lines:
 
Nanofabrication Facility
Capabilities
Equipment List
Rates
Lithography
Dry Etching
Deposition
Annealing
Wet Processing
Processing Recipes
Document Download
Document Search

Technical and educational staff services are possible through the generosity of the National Science Foundation through support via the NNIN.