JEOL

JEOL logoJEOL has partnered with the UCSB nanofab in the area of electron-beam lithography through a significant discount for the facility’s state-of-the-art electron beam lithography system. The partnership involves regular interaction and collaboration with UCSB and JEOL. The system at the facility has a best demonstrated resolution of 7 nm lines:

Technical and educational staff services are possible through the generosity of the National Science Foundation through support via the NNIN.