|Panasonic has partnered with the UCSB facility through a generous agreement to have a production level, advanced ICP dry etch tool in the facility. Etching process information has been shared to significantly improve the quality of our dry etching and to expand into etching of materials that was not possible to the UCSB research community before this partnership. The addition of this system was vital for laboratory improvement and success. The specific tool is:|
Technical and educational staff services are possible through the generosity of the National Science Foundation through support via the NNIN.