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Contact Lithography

Processes are in place for several kinds of photoresist. In order to get the best performance from contact lithography, good contact between the photomask and the sample is required. Edge-bead removal techniques for wafers and pieces are described below.

MJB-3 with IR-Backside Alignment

Contact Lithography Recipes & Established Processes

Edge-Bead Removal

Spectra of Aligners with/without filter

Technical and educational staff services are possible through the generosity of the National Science Foundation through support via the NNIN.