Ellipsometer

Ellipsometer closeup of ellipsometer

Equipment Description:
Ellipsometer

Manufacturer:
Rudolph Research

Model:
AutoELII

 

 

 

General Information and Usage:

This ellipsometer is a single wavelength (632.8 nm) system for characterization of thin films. The system can determine complex index of refraction constants of substrates (k and n) and can determine the thickness and real part of the index of refraction for thin films on substrates with known optical parameters. The thickness can be measured down to 10s of Angstroms and has an accuracy of about 10A on thickness and 0.01 on index of refraction for SiO2 on Silicon. Thicker films can also be measured.

 

Detailed Specifications:

  • Measure single film thickness and index or double film thicknesses
  • 15 second single film measuring time
  • 632.8 nm wavelength
  • 70 degree fixed angle for laser
  • ~ 10A thickness and 0.01 index resolution for SiO2 on Si
  • Can measure bulk optical properties of substrates (k and n)

 

Contact Information:

For additional information regarding the Ellipsometer or if you would like to inquire about using the UCSB Nanofabrication Facility, please contact This email address is being protected from spambots. You need JavaScript enabled to view it.  using the telephone number or e-mail address below. 


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Phone: (805) 893-3918 ext. 219
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Technical and educational staff services are possible through the generosity of the National Science Foundation through support via the NNIN.