Panasonic ICP 2

Panasonic ICP 2

Equipment Description:
ICP #2

Manufacturer:
Panasonic Factory Solutions, Japan

Model:
E640

Instructions:
Operating Instruction Manual

 

 

 

General Information and Usage:

This is a three-chamber tool for etching of a variety of materials. Chamber one is configured as an ICP etching tool with 1000 W ICP power, 500 W RF substrate power, and RT - 80°C operation with back-side He cooling and an electrostatic chuck to maintain controlled surface temperatures during etching. This chamber has Cl2, BCl3, CF4, CHF3, SF6, Ar, N2, and O2 for gas sources and can be used to etch a variety of materials from SiO2 to metals to compound semiconductors. The chamber evacuated with a 2000 lpm Osaka Vacuum magnetically levitated turbo pump, allowing for fast pump down. Chamber two is a 2000 W ICP chamber configures for plasma etching of photoresist and other materials such as BCB. The substrate is not biased and the chamber has CF4 and O2 for the gases. Chamber three is a DI rinsing chamber for rinsing off any etch byproducts before removing the sample from the system. The system accepts 6” wafers or pieces mounted to the wafers. In Automatic mode, multiple wafers can be run through automatically with the cassette-based system.

 

Detailed Specifications:

  • 1000 W ICP source, 500 W RF Sample Bias Source in etching chamber
  • RT - 80°C sample temperature for etching
  • Optimal Emission Monitoring
  • Etch pressure from 0.1 Pa to 5 Pa (0.75 mT - 37.5 mT)
  • Cl2, BCl3, CF4, CHF3, SF6, Ar, N2, and O2 in etch chamber
  • 2000 W ICP ashing chamber
  • RT - 250°C sample temperature for ashing
  • Ashing pressures 50 mT - 500 mT
  • O2, N2, CF4, H2O Vapor for ashing chamber
  • Multiple 6” diameter wafer capable system
  • Pieces possible by mounting to 6” wafer

 

Contact Information:

For additional information regarding the Panasonic ICP #2 or if you would like to inquire about using the UCSB Nanofabrication Facility, please contact This email address is being protected from spambots. You need JavaScript enabled to view it.  using the telephone number or e-mail address below. 

 

 

This email address is being protected from spambots. You need JavaScript enabled to view it.

Phone: (805) 893-3918 ext. 216
E-Mail: This email address is being protected from spambots. You need JavaScript enabled to view it.

 

 

Technical and educational staff services are possible through the generosity of the National Science Foundation through support via the NNIN.