Advanced Vacuum PECVD

 

Equipment Description:

Vision 310 Advanced Vacuum PECVD

 

Manufacturer:

Advanced Vacuum

 

Link: http://www.advanced-vacuum.se/310PECVD.html

 

This open-load system is dedicated to PECVD of SiO2, SiNx, SiOxNy, and a-Si using Silane (2%SiH4, 98% He), N2O, NH3, and N2 gases.  The sample electrode has a 270mm diameter useable area, allowing for multiple 4” wafer depositions in a single run.  Standard operating temperature is 300C, but can be user changed for temps ranging anywhere from 250 to 350C.  The system is equipped with a dual generator, dual frequency option for growth of low-stress Nitride films.

 

Contact Information:

For additional information regarding the Advanced Vacuum PECVD System or if you would like to inquire about using the UCSB Nanofabrication Facility, please contact This email address is being protected from spambots. You need JavaScript enabled to view it.  using the telephone number or e-mail address below. 


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Phone: (805) 893-3918 ext. 219
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Technical and educational staff services are possible through the generosity of the National Science Foundation through support via the NNIN.