Gasonics Aura 2000-LL Downstream Asher

 

 

 

 

 

 

Equipment Description:

Aura 2000-LL Downstream Asher

 

Manufacturer:

Gasonics

 

 

 

The Aura 2000 system is a microwave downstream asher used for the removal of resist and other organic materials.  Samples are loaded onto 8” carrier wafers into the system.  Samples can be heated from 100C to above 350C by heat lamps, while being exposed to microwave-cracked oxygen to remove organic materials.  The microwave excitation of the oxygen is done downstream from the chamber and the reactive oxygen flows through a showerhead to expose the sample, thus completely eliminating ion bombardment.  Resist etch rates of several microns per minute can be achieved and is also effective on fluorine and chlorine plasma exposed resist.

 

Contact Information:

For additional information regarding the Gasonics Asher or if you would like to inquire about using the UCSB Nanofabrication Facility, please contact This email address is being protected from spambots. You need JavaScript enabled to view it.  using the telephone number or e-mail address below. 


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Phone: (805) 893-3918 ext. 219
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Technical and educational staff services are possible through the generosity of the National Science Foundation through support via the NNIN.