Acid Wet Benches

acid wet benchEquipment Description:
Acid Wet Bench

Manufacturer:
Pure Aire Corporation
2219 Agate Court
Simi Valley, California 93065-1839
Phone: (805) 527-1622
Fax: (805) 527-2664

Model:
Custom

 

 

 

General Information and Usage:

The facility contains 5 polypropylene Acid Benches for general wet processing using Acids and Bases. All waste (except for certain chemicals that are collected) are actively neutralized. Two of the benches are dedicated to HF-based processing and the waste stream is metered on these benches to protect the meters in the neutralization system. HF-based processes are limited to these two benches. The benches consist of two sinks with DI water hook ups and industrial water plenum flushes. Laminar flow fume hoods with hepa filtration. Nitrogen guns are also on both sides of the bench for drying samples. Digital stirring hotplates and/or small benchtop ultrasonic units are included for agitation and heating during the process on select benches. POLOS spin rinse dryers or spray puddle etch systems are included in the benches. Custom-built spray etchers (with bench supplied nitrogen) can also be used. Commonly used acids and bases such as H2O2, NH4OH, HCl, H2SO4, and H3PO4 can be dispensed into glassware using pipets connected to small bottles in the process wells at the back of the bench. All processes are done in user-supplied glassware. Acids and Bases are stored in separate cabinets and collection/disposal policies are posted. Two people may use the bench at a time and protective gear such as proper gloves must be used. Acids supplied by the laboratory are: H2SO4, HNO3, H3PO4, 1.0 M Citric Acid, Acetic Acid, HCl, Chrome mask etchant, Aluminum Etchants A and D, Gold Etchant (TFA), and Nickel Etchant (TFB). Bases supplied by the lab are: NH4OH, NaOH, KOH, and H2O2. Other chemicals should be OK'd by laboratory staff prior to use in the laboratory.

 

Detailed Specifications:

  • 2 Sinks, DI water
  • 2 Nitrogen guns for sample drying
  • Digital hot-plate stirrers
  • Ultrasonic Baths
  • NO SOLVENTS
  • HF Processing limited to two benches
  • POLOS Spray-Spin-Rinse systems
  • Hepa Filtered Laminar Flow Hoods

 

Contact Information:

For additional information regarding the Acid Wet Benches or if you would like to inquire about using the UCSB Nanofabrication Facility, please contact This email address is being protected from spambots. You need JavaScript enabled to view it.  using the telephone number or e-mail address below. 


This email address is being protected from spambots. You need JavaScript enabled to view it.
Phone: (805) 893-3918 ext. 208
E-Mail: This email address is being protected from spambots. You need JavaScript enabled to view it.

Technical and educational staff services are possible through the generosity of the National Science Foundation through support via the NNIN.