3-Chamber Cluster Sputter Tool

3-Chamber Cluster Sputter Tool

Equipment Description:
3 chamber Cluster Sputter

Manufacturer:
Sputtered Films

Model:
Endeavor

 

 

 

General Information and Usage:

This is a three chamber cluster tool for DC and AC reactive sputtering of metals and dielectrics from 8” cylindrical or 2-piece (for AC) targets. The chamber is configured for 4” diameter wafers or equivalently sized plates that can secure smaller piece samples. Samples are loaded into a cassette system capable of holding 20 wafers. The system is computer controlled through a GUI. Heating of the substrate to several hundred degrees Celcius is possible through a heating lamp module. Chamber 1 is set up for AC reactive sputtering of Al, Al2O3, AlN, SiO2, or SiN. Chamber 2 is set up for DC reactive sputtering of Ti, W, TiN, TiO2, and W-based oxides. Chamber 3 is set up for Al or Au metal sputtering and has RF back-sputtering capability on the sample for sample cleaning prior to deposition.

 

Detailed Specifications:

  • Multiple 4” diameter wafer capable system
  • Pieces possible through appropriate carrier design
  • Full programmable control through GUI
  • Heating of substrate to several hundred degrees Celcius
  • Chamber 1: AC sputtering of Si, SiN, SiO2, AlN, Al2O3films
    • AlN rate ~ 4.5 nm/min.
    • Al2O3 ~ 6 nm/min.
    • SiO2 rate ~ 4.5 nm/min.
  • Chamber 2: DC sputtering of Ti, TiN, TiO2, W, and W-oxides
    • Ti rate ~ 200 nm/min.
  • Chamber 3: DC sputtering of Al or Au. RF back-sputtering with Argon
    • Al Dep rate ~ 300-400 nm/min.

 

Contact Information:

For additional information regarding the Cluster Sputter or if you would like to inquire about using the UCSB Nanofabrication Facility, please contact This email address is being protected from spambots. You need JavaScript enabled to view it.  using the telephone number or e-mail address below. 


This email address is being protected from spambots. You need JavaScript enabled to view it.
Phone: (805) 893-3918 ext. 210
E-Mail: This email address is being protected from spambots. You need JavaScript enabled to view it.

 

Technical and educational staff services are possible through the generosity of the National Science Foundation through support via the NNIN.