Date: 12th November 2013
Time: 8:00am – 5:00pm (PT)
Location: ESB 1001
This free educational event will cover several aspects Atomic Layer Deposition (ALD) and Ion Beam etch and deposition processes and technologies.
Guest speakers from renowned research & manufacturing organizations, speakers from UCSB, and technical experts from Oxford Instruments will all speak on topics from the fundamentals of these technologies, through to User experiences, and hints and tips from Oxford Instruments. The program will also allow plenty of time for discussion and questions. In addition there will be a technical poster session by Oxford Instruments.
There is no charge for this event and lunch and parking will be provided.
However space is limited so register early! Register here
Annika Peters and Sebastien Pochon, Oxford Instruments
Deirdre Olynick, Lawrence Berkeley National Labs
Max Zhang, Hewlett Packard
and various speakers from UCSB