Custom Made Strip Annealer

annealer

Equipment Description:
Strip Annealer

Manufacturer:
Custom Design

 

General Information and Usage:

Our Strip annealer is primarily used for ohmic contact formation on III-V compound semiconductors. The system runs in a forming gas environment to keep oxygen contamination minimized. Temperature of the graphite strip is electronically controlled to prevent overshoot and the phase changes of the metal can be observed through the stereo microscope while annealing is taking place. This observation is often the best way to get the best ohmic contact. Thermal interlocks prevent the system from overheating and maximum anneal times are on the order of several minutes. Anneals up to 500°C are permitted. The graphite strip is only 1.5 inches wide, limiting the sample size.

 

Equipment Specifications:

  • Temperatures up to 500°C for several minutes
  • Forming gas ambient
  • Sample size limited to 1.5 inches on a side
  • Electronic temperature control
  • Maximum sample size ~ 1.5 inches square
  • Stereo microscope for viewing the contact phase change

 

Contact Information:

For additional information regarding the Strip Annealer or if you would like to inquire about using the UCSB Nanofabrication Facility, please contact This email address is being protected from spambots. You need JavaScript enabled to view it.  using the telephone number or e-mail address below. 


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Phone: (805) 893-3918 ext. 217
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Technical and educational staff services are possible through the generosity of the National Science Foundation through support via the NNIN.