Molecular Vapor Deposition System

Molecular Vapor Deposition System

Equipment Description:
Molecular Vapor Deposition System

Model:
MVD 100E

Manufacturer:
Applied Microstructures, Inc.
1020 Rincon Circle
San Jose, CA 95131
Telephone: 408-907-2885
www.appliedmst.com

 

 

 

 

 

 

 

 

General Information and Usage:

The Molecular Vapor deposition system is used for deposition of a monolayer-thick fluorocarbon film for producing extremely hydrophobic surfaces used for anti-sticking layers for nanoimprinting or anti-stiction layers for MEMS. The system has integrated Oxygen plasma cleaning for organic removal and surface activation and can be run at temperatures up to 80°C.  Multi-step recipes can be created.  The system is currently configured for FDTS (perflourodecyltricholorsilane) and water to producing the coatings. Up to 6” wafers can be coated in the system.

 

Contact Information:

For additional information regarding the Molecular Vapor Deposition System or if you would like to inquire about using the UCSB Nanofabrication Facility, please contact This email address is being protected from spambots. You need JavaScript enabled to view it.  using the telephone number or e-mail address below. 


This email address is being protected from spambots. You need JavaScript enabled to view it.
Phone: (805) 893-3918 ext. 208

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Technical and educational staff services are possible through the generosity of the National Science Foundation through support via the NNIN.