Sample Preparation / Cleaning

Preparation of samples for photolithography may require a simple solvent clean, residual organic removal, particulate removal, HMDS pre-coating, or any combination depending on the condition of your wafer. Photoresist removal also depends on the conditions that the resist was exposed to during the processing after lithography. Below are links to the various techniques used in our laboratory for lithography preparation and photoresist removal. These are general techniques with some general guidelines to assist you in developing the process that will suit your needs.

Technical and educational staff services are possible through the generosity of the National Science Foundation through support via the NNIN.