Standard Pre-Lithography Cleaning Process

  1. Acetone in ultrasonic for 2 minutes.
  2. Methanol in ultrasonic for 2 minutes.
  3. Running DI water for 0.5 minute.
  4. Blow dry with N2 gun.
  5. (Optional) Use PEII etcher at 300 mT O2, 100 W for 30 seconds to remove residual organics. Note that this will leave a native oxide on the surface that may need to be removed (especially prior to a metallization step).
  6. (Optional)Dehydration bake sample on hot plate > 100°C for > 2 min.

Technical and educational staff services are possible through the generosity of the National Science Foundation through support via the NNIN.